Idealliance Releases New Substrate Corrected Color Aim Calculator
The Idealliance Print Properties and Colorimetric Council has released an updated version of the Idealliance SCCA Calculator. The new version contains several important enhancements:
- Both IT8/7.4 and TC1617 (proposed IT8/7.5) datasets included.
- Export function that automatically creates a properly formatted and named CGATS file for use in profiling and color management applications.
- Datasets for both CRPC 1-6, as well as GRACoL 2006 and SWOP 2006 3 and 5 datasets, including XCMYK 2017.
- Adjustment to the Minimum Value Defaults.
The new version can be downloaded from the Idealliance website at www.GRACoL.org, as well as from the Idealliance G7 Expert and Print Properties community sites. The Idealliance SCCA Calculator is one example of the many tools and leading practices created by the Print Properties and Colorimetric Council for free use of the graphic arts community such as brands and suppliers. The Idealliance Print Properties and Colorimetric Council meets monthly to work on critical industry issues, standards creations, specifications, leading practices and most solutions that drive efficiency and profitability for companies around the world. For more information on the Idealliance Print Properties and Colorimetric Committee go to www.idealliance.org or email ppc@idealliance.org.
What is the SCCA Calculator?
The Substrate Relativity (SCCA) Calculator allows advanced users the ability to recalculate industry standard or custom characterization data sets based on the CIELAB values of a given substrate. The procedure utilizes the tristimulus correction methodology defined in ISO 13655 Annex A for correcting measurements based on two backing materials. Once the data is modified relative to the new CIELAB values, the user is provided an idea on how the substrates color will affect the final printed result. The recalculated data can be used to generate profiles for more accurate proofing/converting, and the reported CMYK, RGB and Gray patches can be used for new process control aims when on press with the new substrate.
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